发明名称 |
Apparatus for thermal processing with micro-environment |
摘要 |
A substrate thermal processing system. The system has at least one substrate holding module having a housing configured for holding an isolated environment therein. A substrate heater is located in the housing and has a substrate heating surface. A substrate cooler is located in the housing and having a substrate cooling surface. A gas feed opening into the housing and feeding inert or reducing gas into the housing when the substrate is heated by the heating surface. A gas restrictor is within the housing restricting the fed gas between the substrate heating surface and a surrounding atmospheric region substantially surrounding the substrate heating surface in the housing and forming an aperture through which the fed gas communicates with the atmospheric region.
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申请公布号 |
US2011114623(A1) |
申请公布日期 |
2011.05.19 |
申请号 |
US20090590852 |
申请日期 |
2009.11.13 |
申请人 |
NEXX SYSTEMS, INC |
发明人 |
GOODMAN DANIEL;KEIGLER ARTHUR;GUARNACCIA DAVID G.;JEFFERS MATTHEW R. |
分类号 |
H01L21/477 |
主分类号 |
H01L21/477 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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