| 摘要 |
<p>PURPOSE: A method for generating a data base for a mask is provided to reduce CD(Critical Dimension) variation by minimizing the influence of peripheral pattern density by controlling the size of a pattern according to the density of the pattern. CONSTITUTION: A chip layout region is divided into a plurality of first regions. The density of a pattern(PT1) is measured in each first region. The plurality of first regions are divided into a plurality of second regions according to the density of the measured pattern. The size of a pattern(PT2) in each second region is controlled according to the density of the pattern and is stored in a data base for a mask. Data about the patterns in the plurality of second regions includes each size and density of the patterns.</p> |
