| 摘要 |
PROBLEM TO BE SOLVED: To provide methods for patterning a substrate by imprint lithography. SOLUTION: An imprint head 3100 is fitted to an imprint head support 3910. An imprint head 3910 is fitted so as to always stay at a fixed position. During use, all movements along an X-Y plane are carried out by a motion stage 3600 for the substrate. A system 3900 also includes a liquid dispensation system which dispenses a curable liquid onto the substrate. The liquid dispensation system is coupled to the imprint head 3100. Imprint lithography is a process in which the liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with a previously formed layer on a substrate, in one embodiment, is accomplished by using scatterometry. COPYRIGHT: (C)2011,JPO&INPIT
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