发明名称 TRANSISTOR USING DERIVATIVE POLYMETHYL-METHACRYLATE THIN FILM AS GATE INSULATOR AND PASSIVATION LAYER, AND FABRICATION METHOD THEREOF
摘要 Disclosed are a transistor including a gate insulation layer and an organic passivation layer of a polymer thin film, and a fabrication method thereof. The transistor comprises a substrate, a gate electrode formed on the substrate, a gate insulation layer including a polymethacrylic acid thin film, formed on the gate electrode and the substrate, a channel layer formed on the gate insulation layer, source electrode and drain electrode formed on the channel layer so as to expose at least a part of the channel layer, and an organic passivation layer including a polymethacrylic acid thin film, formed on the source electrode, drain electrode and the partially exposed channel layer. The method for fabricating a transistor comprises steps of forming a gate electrode on a substrate, forming a gate insulation layer of a polymethacrylic acid thin film on the gate electrode and the substrate, forming a channel layer on the gate insulation layer, forming source electrode and drain electrode on the channel layer so as to expose at least a part of the channel layer, and forming an organic passivation layer of a polymethacrylic acid thin film on the source electrode, drain electrode and the partially exposed channel layer.
申请公布号 US2011114953(A1) 申请公布日期 2011.05.19
申请号 US20100771180 申请日期 2010.04.30
申请人 KIM IL DOO;KIM DONG HUN;CHOI SEUNG HUN 发明人 KIM IL DOO;KIM DONG HUN;CHOI SEUNG HUN
分类号 H01L29/786;H01L21/44 主分类号 H01L29/786
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