| 摘要 |
Systems and methods for processing sample processing devices. The system can include a base plate adapted to rotate about a rotation axis. The base plate can include at least one first magnetic element. The system can further include an annular cover, and a sample processing device comprising at least one thermal process chamber. The annular cover can include an inner edge, an outer edge, and at least one second magnetic element. The method can include positioning the sample processing device between the base plate and the annular cover, such that the inner edge of the annular cover is positioned inwardly of the at least one thermal process chamber, and such that the at least one first magnetic element attracts the at least one second magnetic element to force the annular cover in a first direction along the z-axis, urging the sample processing device into contact with the base plate.
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