| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent leakage of a liquid filled in an optical path space of exposure light, in an exposure apparatus for exposing a substrate by irradiating the substrate with exposure light through a liquid. <P>SOLUTION: This exposure apparatus EX includes a projection optical system PL, wherein an optical path space K1 of exposure light between the projection optical system and a substrate P is filled with a liquid LQ, and the substrate is exposed to light through the liquid. The exposure apparatus includes a suction opening 12 formed on an outer side of a recovery opening 22 relative to the optical path space of the exposure light for sucking only gas. The suction opening is formed into an annular shape to surround the optical path space, and arranged at a position facing the substrate. The recovery opening is formed at a position facing the substrate, and the recovery opening and the suction opening are each formed nearly at the same height with respect to the substrate. <P>COPYRIGHT: (C)2011,JPO&INPIT |
