SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING APPARATUS AND STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To keep a gas flow to a substrate constant while controlling a current of a processing gas in a vacuum container by adjusting exhaust flow rates of a plurality of exhaust paths.

SOLUTION: The vacuum container 1 is evacuated through a first exhaust path 63a having a first valve 65a interposed and a second exhaust path 63b having a second valve 65b interposed, thereby the opening extent of the first valve 65a is adjusted so that the pressure in the vacuum container 1 reaches processing pressure P. The opening extent V of a butterfly valve 67 is set to a value described in a table 86 so that the exhaust flow rate of the first exhaust path 63a and the exhaust flow rate of the second exhaust path 63 have set values corresponding to a recipe, and the opening extent of the second valve 65b is adjusted so that a measured value of a differential pressure gauge 68 reaches differential pressureΔP described in the table 86.

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