| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a binary mask blank, a transfer mask and a transfer mask set, suitable for application to double-exposure technology. <P>SOLUTION: A mask blank is provided to be used for manufacturing a binary transfer mask to which ArF exposure light is applied. The mask blank includes, on a light-transmitting substrate 1, successively from the substrate side: a light-shielding film 10 for forming a transfer pattern; and an auxiliary light-shielding film 20 for forming a light-shielding zone in a layered structure with the light-shielding film, wherein the light-shielding film 10 has an optical density of 2.5 or more and 3.1 or less and the auxiliary light-shielding film 20 has an optical density of 0.5 or more. <P>COPYRIGHT: (C)2011,JPO&INPIT |
