| 摘要 |
A pellicle for lithography is provided that includes a pellicle frame provided with an atmospheric pressure adjustment hole that extends through from an outer peripheral face to an inner peripheral face, a ratio S/L of a cross-sectional area S (mm2) of a cross-section that is perpendicular to the depth direction of the atmospheric pressure adjustment hole relative to a length L (mm) in the depth direction of the atmospheric pressure adjustment hole being at least 0.25 mm but no greater than 5.0 mm.
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