发明名称 SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR WAFER PROVIDED WITH ADHESIVE LAYER
摘要 Disclosed is a method for manufacturing a semiconductor device, which is provided with: a step of forming an adhesive layer by forming a film of an adhesive composition on the semiconductor wafer surface on the reverse side of the circuit surface; a step of bringing the adhesive layer into a B-stage by irradiating the adhesive layer with light; a step of cutting the semiconductor wafer into a plurality of semiconductor chips by cutting the semiconductor wafer with the adhesive layer thus brought into the B-stage; and a step of bonding the semiconductor chip with a supporting member or with other semiconductor chip by means of pressure-bonding with the adhesive layer therebetween.
申请公布号 WO2011058995(A1) 申请公布日期 2011.05.19
申请号 WO2010JP70014 申请日期 2010.11.10
申请人 HITACHI CHEMICAL COMPANY, LTD.;MITSUKURA KAZUYUKI;KAWAMORI TAKASHI;MASUKO TAKASHI;KATOGI SHIGEKI;FUJII SHINJIRO 发明人 MITSUKURA KAZUYUKI;KAWAMORI TAKASHI;MASUKO TAKASHI;KATOGI SHIGEKI;FUJII SHINJIRO
分类号 H01L21/52;C09J4/02;H01L21/301 主分类号 H01L21/52
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