发明名称 |
SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR WAFER PROVIDED WITH ADHESIVE LAYER |
摘要 |
Disclosed is a method for manufacturing a semiconductor device, which is provided with: a step of forming an adhesive layer by forming a film of an adhesive composition on the semiconductor wafer surface on the reverse side of the circuit surface; a step of bringing the adhesive layer into a B-stage by irradiating the adhesive layer with light; a step of cutting the semiconductor wafer into a plurality of semiconductor chips by cutting the semiconductor wafer with the adhesive layer thus brought into the B-stage; and a step of bonding the semiconductor chip with a supporting member or with other semiconductor chip by means of pressure-bonding with the adhesive layer therebetween. |
申请公布号 |
WO2011058995(A1) |
申请公布日期 |
2011.05.19 |
申请号 |
WO2010JP70014 |
申请日期 |
2010.11.10 |
申请人 |
HITACHI CHEMICAL COMPANY, LTD.;MITSUKURA KAZUYUKI;KAWAMORI TAKASHI;MASUKO TAKASHI;KATOGI SHIGEKI;FUJII SHINJIRO |
发明人 |
MITSUKURA KAZUYUKI;KAWAMORI TAKASHI;MASUKO TAKASHI;KATOGI SHIGEKI;FUJII SHINJIRO |
分类号 |
H01L21/52;C09J4/02;H01L21/301 |
主分类号 |
H01L21/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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