发明名称 SAMPLE OBSERVATION METHOD USING ELECTRON BEAMS AND ELECTRON MICROSCOPE
摘要 <p>Disclosed is a method for observing the structure or characteristics of a sample by means of an electron microscope, wherein it is possible to densely accumulate charge onto the sample, and to improve the image quality for potential contrast. When performing charge treatment on a sample during the evaluation of the electrical properties and observation of the structure of the sample using electron beams, a sample is irradiated with electron beams set at an incident energy which is within an incident energy band having a high charge storage efficiency during electron beam irradiation, and the irradiation energy is changed while maintaining the incident energy thereof, thereby being able to densely accumulate charge onto the sample.</p>
申请公布号 WO2011058950(A1) 申请公布日期 2011.05.19
申请号 WO2010JP69845 申请日期 2010.11.08
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION;TSUNO NATSUKI;MAKINO HIROSHI;SUZUKI MAKOTO;OMINAMI YUSUKE 发明人 TSUNO NATSUKI;MAKINO HIROSHI;SUZUKI MAKOTO;OMINAMI YUSUKE
分类号 H01J37/28;H01J37/20 主分类号 H01J37/28
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