| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device preventing the deterioration of the reflectance of an optical system and a mask for EUV exposure. <P>SOLUTION: The method for manufacturing the semiconductor device includes: a decompression process ST2 carrying a substrate coated with a resist film into a carrying-in mechanism 13 and decompressing a peripheral atmosphere of the substrate from the atmospheric pressure; a temperature measuring process ST3 measuring a substrate temperature correlated with the quantity of an outgas from the substrate; a decision step deciding whether the EUV exposure is conducted to the substrate on the basis of the result of the measurement of the substrate temperature. When a decision is made for non-EUV exposure, the substrate is carried out to the outside of a carrying-out mechanism 14 without EUV exposure to the substrate. <P>COPYRIGHT: (C)2011,JPO&INPIT |
