MICROLITHOGRAPHIC PROJECTION EXPOSURE

摘要

In an illumination method for illuminating a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection illumination system for performing that method output radiation directed at the substrate and having an output polarization state is produced. By means of a variable adjustment of the output polarization state with the aid of at least one polarization manipulation device the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of po­larization-optical measuring data.