POLYMER FOR UNDER-LAYER OF RESIST, POLYMER COMPOSITION, UNDER-LAYER COMPOSITION OF RESIST, OF PATTERNING DEVICE USING SAME

摘要

PURPOSE: A polymer for a resist underlayer, a resist underlayer composition including the same, and a method for forming patterns are provided to minimize the reflectivity between a resist and an underlayer by securing the adequate refractivity and absorbency of the polymer. CONSTITUTION: A polymer for a resist underlayer includes a repeating unit represented by chemical formula 1 and/or chemical formula 2. A resist underlayer composition includes the polymer and an organic solvent. A method for forming patterns includes the following: A material layer is arranged on a substrate. The resist underlayer is formed on the material layer. A resist layer is formed on the resist underlayer. The substrate is exposed. A developing operation and an etching operation are followed.