| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a substrate surface processing apparatus capable of suppressing degradation of an etching speed due to stay of a low-concentration medical solution, in a substrate surface processing apparatus of a horizontal transport method. <P>SOLUTION: This substrate surface processing apparatus 1 includes: a chemical tank 101 for storing a chemical used for performing a surface treatment of a substrate 106; and a plurality of transport rollers 103 rotatably arranged in the chemical tank for transporting the substrate. The substrate surface processing apparatus subjects the substrate to a surface treatment with the chemical while transporting the substrate. The substrate surface processing apparatus further includes chemical transfer devices 122 arranged in the chemical tank and each formed with an opening 107 allowing the chemical to pass therethrough for transferring the chemical through the openings, wherein the chemical transfer devices are arranged so that each opening is positioned between the transport rollers adjacent to each other. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
