发明名称 PROCESS FOR FUSING GLASS
摘要 When fusing glass members 104, 105 together by irradiating a glass layer 203 with a laser beam L2 along a region R to be fused, a crystallized area 108 formed in the glass layer 203 is taken as an irradiation-initiating point and an irradiation-ending point. Since the crystallized area 108 exhibits a laser absorptance lower than that of the glass layer 203 here, the glass layer 203 is gradually heated when the laser beam L2 is moved along the region R to be fused from the irradiation-initiating point, while the glass layer 203 is gradually cooled when the laser beam L2 is moved along the region R to be fused to the irradiation-ending point. This can prevent residual stresses from occurring in a part including the irradiation-initiating point and irradiation-ending point of the laser beam L2.
申请公布号 US2011113828(A1) 申请公布日期 2011.05.19
申请号 US20090989244 申请日期 2009.04.22
申请人 HAMAMATSU PHOTONICS K.K. 发明人 MATSUMOTO SATOSHI
分类号 C03B29/00 主分类号 C03B29/00
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