发明名称 METAL DEPOSITION
摘要 <p>Systems and methods include depositing one or more materials on a voltage switchable dielectric material. In certain aspects, a voltage switchable dielectric material is disposed on a conductive backplane. In some embodiments, a voltage switchable dielectric material includes regions having different characteristic voltages associated with deposition thereon. Some embodiments include masking, and may include the use of a removable contact mask. Certain embodiments include electrografting. Some embodiments include an intermediate layer disposed between two layers.</p>
申请公布号 WO2011059771(A1) 申请公布日期 2011.05.19
申请号 WO2010US54569 申请日期 2010.10.28
申请人 SHOCKING TECHNOLOGIES, INC.;KOSOWSKY, LEX 发明人 KOSOWSKY, LEX
分类号 H05K1/09;C25D5/00 主分类号 H05K1/09
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