发明名称 METHOD FOR MANUFACTURING ABSORPTION TYPE MULTILAYER FILM ND FILTER CHIP
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing an absorption type multilayer film ND (Neutral Density) filter chip having no burr-shaped defect, by removing a burr-shaped defect generated by press working of an absorption type multilayer film ND filter sheet without giving influence to an optical path part. SOLUTION: The absorption type multilayer film ND filter sheet is prepared by alternately layering oxide dielectric film layers and absorption film layers on at least one surface of a resin film, and the obtained absorption type multilayer film ND filter sheet is press-worked to obtain the absorption type multilayer film ND filter chip 20, and then the burr-shaped defect 21 of the resin film generated on a cut surface of the absorption type multilayer film ND filter chip 20 is melted and removed by flame treatment or infrared ray lamp treatment. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011100042(A) 申请公布日期 2011.05.19
申请号 JP20090255701 申请日期 2009.11.09
申请人 SUMITOMO METAL MINING CO LTD 发明人 OGAMI HIDEHARU
分类号 G02B5/00;C23C14/06 主分类号 G02B5/00
代理机构 代理人
主权项
地址