发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 According to one embodiment, a nonvolatile semiconductor memory device includes a substrate, a stacked body, a plurality of semiconductor pillars and a charge storage film. The stacked body is provided on the substrate, with a plurality of insulating films alternately stacked with a plurality of electrode films, and includes a hydrophobic layer provided between one of the insulating films and one of the electrode films. The hydrophobic layer has higher hydrophobicity than the electrode films. The plurality of semiconductor pillars extend in a stacking direction of the stacked body and pierce the stacked body, and the charge storage film is provided between the electrode films and one of the semiconductor pillars.
申请公布号 US2011115014(A1) 申请公布日期 2011.05.19
申请号 US20100839784 申请日期 2010.07.20
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ICHINOSE DAIGO;IGUCHI TADASHI
分类号 H01L27/115;H01L21/8246 主分类号 H01L27/115
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