发明名称 PLASMA GENERATION DEVICE AND PLASMA PROCESSING DEVICE
摘要 A flange, which forms a portion of a vacuum container, has a rectangular opening surrounded by an insulating frame. A plate-shaped radio-frequency antenna conductor 13 is provided so as to cover the opening, with the insulating frame clamped thereby. In this structure, a radio-frequency power source is connected via a matching box to one end along the length of the radio-frequency antenna conductor, the other end is connected to ground, and electric power is supplied so that a radio-frequency current flows from one end of the radio-frequency antenna conductor to the other. By this method, the impedance of the radio-frequency antenna conductor can be lowered, and high-density plasma with a low electron temperature can be efficiently generated.
申请公布号 US2011115380(A1) 申请公布日期 2011.05.19
申请号 US20090993640 申请日期 2009.05.21
申请人 EMD CORPORATION 发明人 EBE AKINORI;ANDO YASUNORI;WATANABE MASANORI
分类号 H05H1/46;H05H1/24 主分类号 H05H1/46
代理机构 代理人
主权项
地址