发明名称 Device for magnetron sputtering, comprises a target of a coating material, whose electric or magnetic properties reach first values from a threshold temperature lying over room temperature, a ablation surface, and a magnet assembly
摘要 <p>The device for magnetron sputtering, comprises a target of a coating material, whose electric or magnetic properties reach first values from a threshold temperature lying over room temperature, which enables the magnetron sputtering of the coating material, an ablation surface, which is horizontally arranged opposite to a substrate, where the coating material is removed by means of sputtering, a plasma device with electrode assembly for producing a plasma over the ablation surface, and a magnet assembly for producing a plasma limiting magnetic tunnel. The device for magnetron sputtering, comprises a target of a coating material, whose electric or magnetic properties reach first values from a threshold temperature lying over room temperature, which enables the magnetron sputtering of the coating material, an ablation surface, which is horizontally arranged opposite to a substrate, where the coating material is removed by means of sputtering, a plasma device with electrode assembly for producing a plasma over the ablation surface, a magnet assembly for producing a plasma limiting magnetic tunnel adjacent to the ablation surface, and a heating device (11) for heating the target to a predefined threshold temperature or above. The target is a tubular, rotatable target in the following tube target, whose magnet assembly is arranged in the interior of the tube and the heating device for heating a section of the tube target, which extends itself only a part of the circumference of the tube target. The heating device is arranged such that a section of the tube target is heated in which the tube target lies outside the effective range of the magnet assembly. The heating device is formed through an electrode arrangement, which is arranged for producing a glow discharge that burns between the tube target and an anode of the electrode assembly. The tube target is arranged with spacers on a carrier tube (2), where the tube target and the carrier tube are thermally decoupled to each other. The reflection and/or absorbing surfaces for reflection and/or absorption of the heat radiation outgoing from the target surface are arranged opposite to the target surface, which is not turned to the substrate. The coolable contact surfaces of a cooling element are detachably present layerwisly on the target surface. The means are arranged for detection of temperature-dependent properties of the tube target for determination and/or control of target temperature. An independent claim is included for a process for coating a substrate.</p>
申请公布号 DE102009053609(A1) 申请公布日期 2011.05.19
申请号 DE20091053609 申请日期 2009.11.16
申请人 VON ARDENNE ANLAGENTECHNIK GMBH 发明人 FABER, JOERG
分类号 C23C14/35;C23C14/14 主分类号 C23C14/35
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