NOVEL SILICON PRECURSORS TO MAKE ULTRA LOW-K FILMS WITH HIGH MECHANICAL PROPERTIES BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION,申请号KR20117004857-传众专利搜索

发明名称	NOVEL SILICON PRECURSORS TO MAKE ULTRA LOW-K FILMS WITH HIGH MECHANICAL PROPERTIES BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
摘要
申请公布号	KR20110052674(A)	申请公布日期	2011.05.18
申请号	KR20117004857	申请日期	2009.07.28
申请人	APPLIED MATERIALS, INC.	发明人	YIM, KANG SUB;DEMOS ALEXANDROS T.
分类号	H01L21/205;H01L21/312	主分类号	H01L21/205
代理机构		代理人
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