ETHING NOZZLE DEVICE AND ETHING APPARATUS USING THE SAME

摘要

PURPOSE: An etching nozzle device and an etching device using the same are provided to prevent the surface defects due to remaining etchant by blocking the flow of the remaining etchant from the etching nozzle to a substrate. CONSTITUTION: An etching nozzle(10) is vertically installed in a nozzle frame(20). The nozzle frame is formed along the vertical direction of an erected substrate. An etching nozzle unit(50) includes a connection frame(30), a fixed frame(40), and a guide groove(22,32,42). The connection frame is formed in the left and right directions of the substrate. An etchant blocking unit(60) is rotatably combined with a support stand(65).