| 摘要 |
PURPOSE: A plasma generating apparatus is provided to enhance the density of plasma which is generated by interlinking one or more ICP(Inductively Coupled Plasma) antenna to an angular division electrode and to enhance the uniformity of plasma by removing the standing wave effect. CONSTITUTION: The upper side of a vacuum chamber is closed by insulating vacuum plates having a penetration hole. An electrostatic chuck(12) is arranged in the center of the inside of the vacuum chamber. The electrostatic chuck applies the external bias RF. A substrate is placed in the upper side of the electrostatic chuck. A plurality of plate antennas are coupled with a penetration hole. The plate antennas generate plasma by the electrostatic coupling within the vacuum chamber by applying external source RF. |
