发明名称 Non-volatile memory cell and fabrication method thereof
摘要 A non-volatile memory cell and the fabrication method thereof are provided. The non-volatile memory cell comprises a top electrode, a bottom electrode and an oxide layer disposed between the top electrode and the bottom electrode. The oxide layer comprises a relatively low oxygen content layer adjacent to the bottom electrode, a relatively high oxygen content layer adjacent to the top electrode, and a transition layer disposed between the relatively high and the relatively low oxygen content layers. The transition layer has an oxygen concentration within a range between those of the relatively high and the relatively low oxygen content layers.
申请公布号 US7943917(B2) 申请公布日期 2011.05.17
申请号 US20090420115 申请日期 2009.04.08
申请人 NANYA TECHNOLOGY CORP. 发明人 HSIEH CHUN-I;WU CHANG-RONG
分类号 H01L29/02;H01L29/04;H01L47/00 主分类号 H01L29/02
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