发明名称 GROUP III-V DEVICES WITH DELTA-DOPED LAYER UNDER CHANNEL REGION
摘要 <p>A group III-V material device has a delta-doped region below a channel region. This may improve the performance of the device by reducing the distance between the gate and the channel region.</p>
申请公布号 KR20110051271(A) 申请公布日期 2011.05.17
申请号 KR20117007694 申请日期 2009.12.02
申请人 INTEL CORPORATION 发明人 HUDAIT MANTU K.;TOLCHINSKY PETER G.;CHAU ROBERT S.;RADOSAVLJEVIC MARKO;PILLARISETTY RAVI;BUDREVICH AARON A.
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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