发明名称 |
POLYORGANSILOXAN, HARZZUSAMMENSETZUNG UND STRUKTURIERUNGSVERFAHREN |
摘要 |
A polyorganosiloxane compound is modified such that some silicon-bonded hydroxyl groups are substituted with acid labile groups and/or intermolecular or intramolecular crosslinks form with a crosslinking group having a C-O-C linkage. Cured films of a composition comprising the polyorganosiloxane are useful as interlayer dielectric films on TFT substrates. |
申请公布号 |
AT507257(T) |
申请公布日期 |
2011.05.15 |
申请号 |
AT20090251181T |
申请日期 |
2009.04.24 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KATO, HIDETO;FURIHATA, TOMOYOSHI;HIRANO, YOSHINORI;FURUYA, MASAHIRO |
分类号 |
C08G77/14;C08K5/1515;C08K5/3442;C08K5/42;C08L83/10;G03F7/075;H01L21/312 |
主分类号 |
C08G77/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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