发明名称 POLYORGANSILOXAN, HARZZUSAMMENSETZUNG UND STRUKTURIERUNGSVERFAHREN
摘要 A polyorganosiloxane compound is modified such that some silicon-bonded hydroxyl groups are substituted with acid labile groups and/or intermolecular or intramolecular crosslinks form with a crosslinking group having a C-O-C linkage. Cured films of a composition comprising the polyorganosiloxane are useful as interlayer dielectric films on TFT substrates.
申请公布号 AT507257(T) 申请公布日期 2011.05.15
申请号 AT20090251181T 申请日期 2009.04.24
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 KATO, HIDETO;FURIHATA, TOMOYOSHI;HIRANO, YOSHINORI;FURUYA, MASAHIRO
分类号 C08G77/14;C08K5/1515;C08K5/3442;C08K5/42;C08L83/10;G03F7/075;H01L21/312 主分类号 C08G77/14
代理机构 代理人
主权项
地址