MASK MATERIAL COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR BATTERY

摘要

PURPOSE: A mask material composition is provided to enable use for a diffusion barrier of an impurity diffusing component into a semiconductor substrate. CONSTITUTION: A mask material composition comprises a siloxane resin containing a repeating unit represented by chemical formula (a1). In chemical formula (a1), R1 is a single bond or C1~5 alkylene group; and R2 is C6~20 aryl group. A method for forming an impurity diffusion layer comprises the steps of: selectively applying the mask material composition to a semiconductor substrate; and selectively applying impurity diffusion components to the semiconductor substrate using the mask material composition as a mask.