| 发明名称 |
CHEMICAL VAPOR DEPOSITION COATING, ARTICLE, AND METHOD |
| 摘要 |
<p>The present invention relates to a chemical vapor deposition coating, a chemical vapor deposition article, and a chemical vapor deposition method. The coating, article, and method involve thermal decomposition of dimethylsilane to achieve desired surface properties.</p> |
| 申请公布号 |
WO2011056550(A1) |
申请公布日期 |
2011.05.12 |
| 申请号 |
WO2010US54058 |
申请日期 |
2010.10.26 |
| 申请人 |
SILCOTEK CORP.;SMITH, DAVID A.;MATTZELA, JAMES B.;SILVIS, PAUL H.;BARONE, GARY A. |
发明人 |
SMITH, DAVID A.;MATTZELA, JAMES B.;SILVIS, PAUL H.;BARONE, GARY A. |
| 分类号 |
C23C16/32;B05D7/24;C23C16/56 |
主分类号 |
C23C16/32 |
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