| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion lithography device which improves removing of liquid from the surface of a substrate and/or substrate table. <P>SOLUTION: The lithography device includes: a liquid supply system constituted so that liquid is supplied to space between a projection system and the substrate; a first gas knife 410 arranged so that the space is surrounded partially at least; and a liquid removing device 420 which is adjacent to part of a gas knife and is positioned along with this. The gas knife is formed such that, when the substrate moves in any direction on surface of the substrate, the direction passing along an optical axis of the device, by at least 36-degree in arc, the liquid, on substrate, within the surface which is perpendicular to the surface of the substrate and which includes a direction, is moved to the liquid removing device along with the gas knife by means of a combined effect between the gas knife and the further movement of the substrate in the direction. <P>COPYRIGHT: (C)2011,JPO&INPIT |
