| 发明名称 |
COMPOSITION, RESIST FILM, METHOD FOR FORMING PATTERN AND INKJET RECORDING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition excellent in sensitivity to actinic radiation, radiation or heat, a resist film formed using the composition, a method for forming a pattern using the composition and an inkjet recording method using the composition. <P>SOLUTION: The composition comprises: a compound represented by the formula: A-LG (wherein A is a residue represented by the formula: (A-1); and LG is a group that leaves and produces an acid represented by the formula: A-H when acting an acid on the same); and a compound that produces an acid when exposed to actinic radiation or radiation and/or a compound that produces an acid when heated. <P>COPYRIGHT: (C)2011,JPO&INPIT |
| 申请公布号 |
JP2011093856(A) |
申请公布日期 |
2011.05.12 |
| 申请号 |
JP20090250886 |
申请日期 |
2009.10.30 |
| 申请人 |
FUJIFILM CORP |
发明人 |
TSUCHIMURA TOMOTAKA;KAWABATA KENJI;ITO TAKAYUKI |
| 分类号 |
C07C311/51;C07C311/48;C09D5/25;C09D201/02;G03F7/004;G03F7/039 |
主分类号 |
C07C311/51 |
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