| 摘要 |
PROBLEM TO BE SOLVED: To provide an ultraviolet irradiation apparatus and method, along with a substrate processing apparatus, capable of preventing reduction of the yield of manufacture. SOLUTION: The substrate processing apparatus includes a chamber having an attracting mechanism, a movable holding mechanism provided within the chamber to hold the substrate, an ultraviolet irradiating mechanism for irradiating the ultraviolet ray to the substrate held by the holding mechanism, a heating mechanism for heating the substrate provided within the chamber, and a moving mechanism having a driving source provided outside the chamber and a transferring member connected to the holding mechanism to transfer a driving force of the driving source to the holding mechanism. COPYRIGHT: (C)2011,JPO&INPIT |
