发明名称 STRUCTURES AND METHODS OF TRIMMING THRESHOLD VOLTAGE OF A FLASH EEPROM MEMORY
摘要 PURPOSE: A structure for controlling the threshold voltage of a flash EEPROM and a method thereof are provided to control the threshold voltage of an FET NVM cell in an MLC operation by applying a specific signal to the drain of the FET NVM cell. CONSTITUTION: In a structure for controlling the threshold voltage of a flash EEPROM and a method thereof, a first voltage is applied to a control gate. A second voltage is applied to the bulk of the FET NVM cell. A specific is applied to the drain of the repeatedly programmed FET NVM cell. The polarity of the first and second voltage is opposite to the polarity of the signal.
申请公布号 KR20110049657(A) 申请公布日期 2011.05.12
申请号 KR20100088777 申请日期 2010.09.10
申请人 FS SEMICONDUCTOR CORP., LTD. 发明人 WANG LEE Z.;HUANG JUI HUNG
分类号 G11C16/34;G11C16/12;G11C16/30 主分类号 G11C16/34
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