发明名称 |
STRUCTURES AND METHODS OF TRIMMING THRESHOLD VOLTAGE OF A FLASH EEPROM MEMORY |
摘要 |
PURPOSE: A structure for controlling the threshold voltage of a flash EEPROM and a method thereof are provided to control the threshold voltage of an FET NVM cell in an MLC operation by applying a specific signal to the drain of the FET NVM cell. CONSTITUTION: In a structure for controlling the threshold voltage of a flash EEPROM and a method thereof, a first voltage is applied to a control gate. A second voltage is applied to the bulk of the FET NVM cell. A specific is applied to the drain of the repeatedly programmed FET NVM cell. The polarity of the first and second voltage is opposite to the polarity of the signal.
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申请公布号 |
KR20110049657(A) |
申请公布日期 |
2011.05.12 |
申请号 |
KR20100088777 |
申请日期 |
2010.09.10 |
申请人 |
FS SEMICONDUCTOR CORP., LTD. |
发明人 |
WANG LEE Z.;HUANG JUI HUNG |
分类号 |
G11C16/34;G11C16/12;G11C16/30 |
主分类号 |
G11C16/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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