INDIUM TIN OXIDE SPUTTERING TARGET AND TRANSPARENT CONDUCTIVE FILM FABRICATED BY USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a transparent conductive film which does not corrode a lower part material and other materials due to the excellent etching working property and does not cause problems such as residual dross, and to provide a sputtering target for forming the transparent conductive film. SOLUTION: The indium tin oxide sputtering target includes indium oxide (In2O3), tin oxide (SnO2) and gallium. The content of tin atoms is 5 to 15 atomic percent of the total amount of indium atom and tin atom and the content of gallium atoms is 0.5 to 7 atomic percent of the total amount of indium atom, silver atom and gallium atom. COPYRIGHT: (C)2011,JPO&INPIT