发明名称 |
MULTIPLE TECHNOLOGY NODE MASK |
摘要 |
A method of fabricating a mask set is provided. The method includes providing mask data associated with a plurality of mask layers. The mask data includes a first pattern associated with a first technology node and a second pattern associated with a second technology node. The method continues with determining to form a multi-technology node mask (MTM) for a first mask layer of the plurality of mask layers. The MTM for the first mask layer is formed, which includes features associated with the first pattern and features associated with the second pattern.
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申请公布号 |
US2011113389(A1) |
申请公布日期 |
2011.05.12 |
申请号 |
US201113007048 |
申请日期 |
2011.01.14 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LIN FENG LUNG;WU KUAN LIANG;TSAI FEI-GWO;LIANG CHE-RONG |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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