| 摘要 |
<P>PROBLEM TO BE SOLVED: To simultaneously transfer various pitch patterns, each with high a resolution. <P>SOLUTION: An exposure apparatus includes an illuminating optical system 12 for illuminating a reticle R with illumination light IL, and a projecting optical system PL to project an image of a reticle R pattern onto a wafer W. In the exposure apparatus, illumination conditions of the reticle R are variable, and a shaping optical system for generating a larger light amount distribution in a plurality of areas than in the other area, and a polarization setting member to set a polarization state of luminous flux generated from diffraction optical devices 21, 22 are mounted by the diffraction optical devices 21, 22 generating luminous flux, each distributing in the plurality of areas whose centers are arranged outside a light axis on a prescribed surface inside the illuminating optical system 12 which is conjugate to the pupil surface of the projecting optical system PL. <P>COPYRIGHT: (C)2011,JPO&INPIT |
