发明名称 MAGNET UNIT, AND MAGNETRON SPUTTERING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a magnet unit capable of easily regulating the film thickness distribution of a thin film to be deposited on a substrate without increasing the length or the width of a target. <P>SOLUTION: In the magnet unit, a first magnet element consisting of a first magnet and a second magnet having the polarity different from that of the first magnet is fixed on a first yoke plate provided in the short side direction of a cathode electrode; a third magnet, a fourth magnet and a fifth magnet are arranged respectively on a second yoke plate provided on both sides in the longitudinal direction of the cathode electrode; (n-1) pieces of projecting magnets (where n denotes a positive integer equal to or larger than 2) extend inward in the longitudinal direction of the second yoke plate from the inner side of the fourth magnet; (n) pieces of extending magnets are arranged on both sides of the projecting magnets with the predetermined spacing from the fourth magnet; and a magnetic track having (2n-1) pieces of folded-back sections on both ends in the longitudinal direction is formed on the target by the projecting magnets and the extending magnets. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011094180(A) 申请公布日期 2011.05.12
申请号 JP20090248420 申请日期 2009.10.29
申请人 CANON ANELVA CORP 发明人 ENDO TETSUYA;ABARA EINSTEIN NOEL
分类号 C23C14/35;H05H1/46 主分类号 C23C14/35
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