AN ETCHING SOLUTION COMPOSITION

摘要

PURPOSE: An etchant composition is provided to simplify an etching process and to improve productivity by simultaneously etching a triplet film. CONSTITUTION: An etchant composition for etching a triple film is constituted by an indium-based metal film, an aluminum-based metal film, and a titanium-based or molybdenum-based metal film, wherein the etchant composition comprises: 0.1 wt % to 10 wt % of a ferrous compound; 0.1 wt % to 10 wt % of nitric acid; 0.01 wt % to 5 wt % of a fluorine compound; with the remainder being water, and further comprises 0.1 wt % to 5 wt % of a phosphate compound.