发明名称 DEVELOPING METHOD AND DEVELOPING APPARATUS
摘要 <p>PURPOSE: A developing method and developing apparatus are provided to optimize the reaction speed of a substrate without causing collisions with a substrate in a reaction tube. CONSTITUTION: In a developing method and developing apparatus, a substrate is fixed at a first stop position in a transfer duct to supply a developing solution to the substrate. The substrate is moved from a first stop position to a second stop position by a first speed. In the second stop position, the developing solution is substantially removed from the substrate. The lowest limit moving speed is determined. A set time is provided to a developing time until stopping developing from the second stop position.</p>
申请公布号 KR20110049750(A) 申请公布日期 2011.05.12
申请号 KR20110026345 申请日期 2011.03.24
申请人 TOKYO ELECTRON LIMITED 发明人 SADA TETSUYA
分类号 G02F1/13;H01L21/68;B65G49/06;G02F1/1333;G03F7/30;H01L21/027;H01L21/677 主分类号 G02F1/13
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