发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
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申请公布号 |
US2011109887(A1) |
申请公布日期 |
2011.05.12 |
申请号 |
US20110986576 |
申请日期 |
2011.01.07 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JANSEN HANS;BASELMANS JOHANNES JACOBUS MATHEUS;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;MERTENS JEROEN JOHANNES SOPHIA MARIA;MULKENS JOHANNES CATHARINUS HUBERTUS;STAVENGA MARCO KOERT;STREEFKERK BOB;VAN DER HOEVEN JAN CORNELIS;GROUWSTRA CEDRIC DESIRE |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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地址 |
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