发明名称 PROCESS FOR PRODUCTION OF HYDROPHILIC SILICA FILM, HYDROPHILIC SILICA FILM, AND ACRYLIC RESIN SUBSTRATE HAVING HYDROPHILIC SILICA FILM ATTACHED THERETO
摘要 <p>Disclosed is a silica thin film having excellent hydrophilicity, which can be produced at low cost and at low temperature. Also disclosed is a process for producing a hydrophilic silica film, which comprises: a reaction step (step S100) of mixing at least a tetraalkyl orthosilicate, an organic solvent and water with one another to cause the reaction among these components; a film formation step (step S200) of supplying a solution produced in the reaction step onto a substrate to form a film on the substrate; and a subsequent hydrolysis step (step S400) of bringing the film produced in the film formation step into contact with water to hydrolyze the film.</p>
申请公布号 WO2011055553(A1) 申请公布日期 2011.05.12
申请号 WO2010JP06536 申请日期 2010.11.08
申请人 SHINSHU UNIVERSITY;MURAKAMI, YASUSHI;SHIMIZU, WATARU;HOKKA, JUNSUKE 发明人 MURAKAMI, YASUSHI;SHIMIZU, WATARU;HOKKA, JUNSUKE
分类号 C01B33/12;C09D7/12;C09D183/02 主分类号 C01B33/12
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