发明名称 |
PROCESS FOR PRODUCTION OF HYDROPHILIC SILICA FILM, HYDROPHILIC SILICA FILM, AND ACRYLIC RESIN SUBSTRATE HAVING HYDROPHILIC SILICA FILM ATTACHED THERETO |
摘要 |
<p>Disclosed is a silica thin film having excellent hydrophilicity, which can be produced at low cost and at low temperature. Also disclosed is a process for producing a hydrophilic silica film, which comprises: a reaction step (step S100) of mixing at least a tetraalkyl orthosilicate, an organic solvent and water with one another to cause the reaction among these components; a film formation step (step S200) of supplying a solution produced in the reaction step onto a substrate to form a film on the substrate; and a subsequent hydrolysis step (step S400) of bringing the film produced in the film formation step into contact with water to hydrolyze the film.</p> |
申请公布号 |
WO2011055553(A1) |
申请公布日期 |
2011.05.12 |
申请号 |
WO2010JP06536 |
申请日期 |
2010.11.08 |
申请人 |
SHINSHU UNIVERSITY;MURAKAMI, YASUSHI;SHIMIZU, WATARU;HOKKA, JUNSUKE |
发明人 |
MURAKAMI, YASUSHI;SHIMIZU, WATARU;HOKKA, JUNSUKE |
分类号 |
C01B33/12;C09D7/12;C09D183/02 |
主分类号 |
C01B33/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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