| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint mold capable of easily changing its uneven pattern. SOLUTION: Since the imprint mold has an array of a plurality of pins which move up and down, a shape of an uneven pattern formed on the imprint mold can be easily changed by changing a projection amount of each pin. Consequently, the uneven pattern can be suitably changed in accordance with a desired three-dimensional pattern structure, thereby suppressing the number of imprint molds needed to form the desired three-dimensional pattern structure. COPYRIGHT: (C)2011,JPO&INPIT
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