发明名称 SUBSTRATE TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of recording and designating an operation frequency of a transportation robot in a transportation chamber. SOLUTION: The substrate treatment apparatus includes robot controllers 13a and 13b which control a first transportation means that transports a substrate in a vacuum, and an administrative control controller 13 which issues a command to the robot controllers 13a and 13b. Robot operation frequency information is stored in a polling message for periodically confirming a communication state between the robot controllers 13a and 13b and the administrative control controller 13. The operation frequency information is transmitted to an operation part and displayed on an operation screen. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011096719(A) 申请公布日期 2011.05.12
申请号 JP20090246590 申请日期 2009.10.27
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 HORII RITSUO
分类号 H01L21/677;H01L21/02 主分类号 H01L21/677
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