Master structure for embossing and/or printing foils in e.g. printing technology for structured application of liquid, has monocrystalline substrate area comprising thickness such that area is formed with curvature radius

摘要

The structure has a monocrystalline substrate area (130) comprising relief structures i.e. trenches (112, 114), on a surface (110) of the area. The surface of the substrate area is provided for embossing and/or printing base materials. The monocrystalline substrate area comprises thickness in such a manner that the substrate area is formed with curvature radius at a range of 1mm to 1m. The monocrystalline substrate area comprises monocrystalline semiconductor material i.e. monocrystalline silicon, and is fastened to a carrier structure by a soldering connection or adhesive connection. Independent claims are also included for the following: (1) a system for continuous embossing and/or printing of base materials (2) a method for embossing and/or printing of base materials.