| 摘要 |
A transparent conductive film for lamination on a substrate and comprising an ITO film and an FTO film, wherein a part or all of the crystal structure of a surface of the FTO film is orthorhombic, and a transparent conductive film for lamination on a substrate and comprising an ITO film and an FTO film, wherein the thickness of the FTO film is within a range from 5 nm to 20 nm and the FTO film is a continuous film. A method of producing the transparent conductive films includes depositing the ITO film on a substrate using a pyrosol process, and subsequently depositing the FTO film continuously on top of the ITO film.
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