PATTERN REPLICA METHOD BY USING OBLIQUE ANGLE DEPOSITION

摘要

PURPOSE: A pattern replica method using oblique angle deposition is provided to form a pattern on an optical pattern without a lithography process, thereby reducing process time and process costs. CONSTITUTION: Patterns are formed on a substrate at a fixed interval. A first deposition material is deposited to form a first thin film layer(310) on patterns. The first thin film layer comprises a plurality of first patterns which has a vertically spiral structure. First patterns are tilted by a first incident angle. A second deposition material is deposited to form a second thin film layer(330) on the first thin film layer. The second thin film layer comprises a plurality of second patterns(331) which has a vertical structure on the first patterns. The substrate supported by the support plate has a second incident angle.