| 摘要 |
The present invention provides a photoresist composition comprising a resin comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a C1-C6 fluorine-containing alkyl group, R2 represents a hydrogen atom or a methyl group, and A represents a C1-C10 divalent saturated hydrocarbon group, and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator represented by the formula (II): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a single bond or a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, Y1 represents a C1-C36 aliphatic hydrocarbon group which can have one or more substituents, etc., and Z+ represents an organic counter cation.
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