EXPOSURE APPARATUS, EXPOSURE METHOD, EXPOSURE APPARATUS MAINTENANCE METHOD, EXPOSURE APPARATUS ADJUSTMENT METHOD AND DEVICE MANUFACTURING METHOD

摘要

An exposure apparatus (EX) exposes a substrate (P) using exposure light (EL) via a liquid (LQ). The exposure apparatus (EX) comprises a substrate holding part (7), which releasably holds and is capable of moving a substrate (P), a management apparatus (3), which manages a status of usage of a dummy substrate (DP) that the substrate holding part (7) is capable of holding.