FOCUS TEST MASK, FOCUS MEASURING METHOD, EXPOSURE APPARATUS, AND EXPOSURE METHOD

摘要

Disclosed is a focus test reticle for measuring focus information. The focus test reticle has an outer pattern, and the outer pattern has: a line pattern composed of a light blocking film extending in the Y direction; a phase shift section, which is provided on the positive X direction side of the line pattern, and has a line width smaller than that of the line pattern; a light transmitting section, which is provided on the negative X direction side of the line pattern, and has a line width smaller than that of the line pattern; a light transmitting section, which is provided on the positive X direction side of the phase shift section; and a phase shift section which is provided on the negative X direction side of the light transmitting section. The focus information of a projection optical system can be measured with high measurement repeatability and high measuring efficiency.