发明名称 Method for inspection of defects on substrate
摘要 PURPOSE: A method for inspecting a minute defect on a substrate is provided to prevent the damage of a probe by scanning the substrate while maintaining a separated state. CONSTITUTION: A probe of an SPM(Scanning Probe Microscopy) is located by being separated from a substrate. The probe scans the substrate by varying the position of the probe with the substrate(S300). An inducing current value which is applied to the probe is measured. The inducing current value is created by the differences of a shape or a material according to the position of the substrate. A defect is determined by comparing more than two different inducing current values which are measured at two different places(S400).
申请公布号 KR20110048080(A) 申请公布日期 2011.05.11
申请号 KR20090101730 申请日期 2009.10.26
申请人 发明人
分类号 G01Q10/00;G01Q80/00;H01L21/66 主分类号 G01Q10/00
代理机构 代理人
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